supported by Swedish Royal Academy of Science by a project with Chalmers University of Technology



  • Developed method for processing and interpretation of electron spectra allows studying sharp or diffuse interfaces with nanometer accuracy;

  • Method is non destructive, and suitable for in situ analysis of multilayer structures;

  • Depth of analysis depends only on the energy of incident electrons. For example, varying the beam energy from 4 to 32keV one can analyze a copper target depth from 25 to 1600nm;

  • The spectrum measuring time is about few seconds (max time <1min)

  • Accuracy of depth profile measurement can be increased. Enhancement of energy resolution down to 0.2% together with current resolution down to 0.05% results in analysis accuracy above 0.1nm.